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Introduction to the Lab

What is AlN Heater?

Aluminum Nitride Heater

It is applied to semiconductor photo process and is a ceramic heater for the purpose of curing photo resist.

Advantages of AlN Heater

  • High thermal
    conductivity/thermal shock resistance

    Uniform heat distribution,
    suitable for high thermal conductivity needs

  • Low coefficient of thermal expansion

    Resistance to temperature change with
    a coefficient of thermal expansion
    similar to that of Si

  • Strong corrosion resistance to
    fluorine and chlorine gas

    Excellent corrosion resistance to
    reduce particles generated during processing

Technology possessed

  • 1

    Circuit design technology considering temperature uniformity characteristics

  • 2

    Brazing bonding technology

  • 3

    Can be used in various temperature ranges (can be designed according to the application from low temperature to high temperature range)

  • 4

    Securing excellent durability and securing high reliability

  • 5

    Securing precision circuit printing technology

  • 6

    Securing heat treatment element technology

  • 7

    Core parts for semiconductor photo equipment

  • 8

    Leading technology for thin film heater development (with development capability)

  • 9

    Electroless plating technology: Cu, Ni, Au electroless plating technology